TSMC confirms 7nm EUV in 2019
http://www.tsmc.com/uploadfile/ir/quarterly/2016/4hBX9/E/TSMC 4Q16 transcript.pdf
Excerpt from TSMC Q4 2016 earnings call
Mehdi Hosseini - Susquehanna Financial Group - Analyst
Okay. Then when we look into 7 nanometer and some of your competitors have a different definition of 7. Can you help us understand how your N7, compete and is positioned against your competitors?
Elizabeth Sun - Taiwan Semiconductor Manufacturing Company Ltd - Senior Director, TSMC Corporate Communications Division
So Mehdi is saying that our 7 nanometer definition is different from other companies' 7 nanometer definition, so how do we compete at 7?
Morris Chang - Taiwan Semiconductor Manufacturing Company Ltd - Chairman
Our 7 nanometer definition is different from somebody else's? Well, I'll let Mark answer.
Mark Liu - Taiwan Semiconductor Manufacturing Company Ltd - President and Co-CEO
I wouldn't want to comment on other people's 7 nanometer. Our 7 nanometer is under qualification now and it will be qualified as according to plan from the end of first quarter. And we have already more than 20 customers design-in on this 7 nanometer and this year alone we estimate will be 15, 20 tapeouts already. So this is our momentum build so far on a seven nanometer and no other competitor is getting to this stage of this leading edge technology. So we have -- we are to -- remember I mentioned last time we'll have 5 nanometer two years from now and forget about the name. That will be a full node shrink and that will sit competing well with any technology come out at that time. Okay, let me add some on 7 nanometer. We will maintain our 7 nanometer competitiveness just like we do on 28 and 16. We will have a technology currently planned as 7 nanometer but with the EUV insertion in the second year of 7 nanometer, just one year -- approximately one year after. And that can greatly simplify the process and without increase the cost. And that is if customer can take advantage of minor design it can further reduce their density -- increase their density and reduce their die cost. That is our plan to maintain that competitiveness of the 7 nanometer the year after. So we think 7 nanometer is a well adopted node by all the customers and we plan for the subsequent technology to shore up the demand continuously. And we hope to use this technology -- I mean the second-year technology to prepare for the EUV production experience for the full fledged EUV technology on 5. Then our customers can have a very hopefully smooth getting to from our 7 to our 5 nanometer technology. So that is how we maintain our technology competitiveness.
Mehdi Hosseini - Susquehanna Financial Group - Analyst
May I ask a clarification question?
Elizabeth Sun - Taiwan Semiconductor Manufacturing Company Ltd - Senior Director, TSMC Corporate Communications Division
Sure.
Mehdi Hosseini - Susquehanna Financial Group - Analyst
I think if I heard you correctly is you will insert -- if I heard you correctly you said you will insert EUV in this second year of your 7 nanometer, which suggests to me that you may actually be able to commercialize (technical difficulty) conclusion here?
Elizabeth Sun - Taiwan Semiconductor Manufacturing Company Ltd - Senior Director, TSMC Corporate Communications Division
Mehdi, I'm afraid that your voice was broken at some point in time. Can you please repeat? We heard you, that you said that we will insert EUV in the second year of 7 nanometer and then you had something but it was cut off. Can you repeat that part?
Mehdi Hosseini - Susquehanna Financial Group - Analyst
Sure. Yes, sorry about that. I just wanted to make sure I understand the EUV commentary correctly. You said that you will insert EUV in the second year of 7 nanometer. That suggests to me that you may actually be able to insert EUV before competitors that have said insertion would happen at 5. Is that the right conclusion as we compare and try to better understand your competitiveness at 7 nanometer?
Mark Liu - Taiwan Semiconductor Manufacturing Company Ltd - President and Co-CEO
Yes, we will commercialize the 7 EUV in the second year of our 7-nanometer production. I wouldn't comment on when will our competitor insert their EUV. That is -- I don't intend to do the comparison here.
Another article about EUV at 7nm
http://semimd.com/blog/2017/01/19/innovations-at-7nm-to-keep-moore’s-law-alive/
TSMC’s 7nm development manager, S.Y. Wu, speaking at IEDM, said quadruple patterning and etch (4P4E) will be required for critical layers until EUV reaches sufficient maturity. “EUV is under development (at TSMC), and we will use 7nm as the test vehicle.
Huiming Bu, who presented the IBM Alliance 7nm paper at IEDM, said “EUV delivers significant depth of field (DoF) improvement” compared with the self-aligned quadruple (SAQP) required for the metal lines with immersion scanners.
A main advantage for EUV compared with multi-patterning is that designs would spend fewer days in the fabs. Speaking at ISS, Gary Patton, the chief technology officer at GlobalFoundries, said EUV could result in 30-day reductions in fab cycle times, compared with multiple patterning with 193nm immersion scanners, based on 1.5 days of cycle time per mask layer.
TSMC's 7nm EUV products should be out in H2 2019. AMD has a lot of choice and flexibility now that they have amended WSA. It would be interesting to see AMD CPUs manufactured at TSMC 7nm EUV go up against Intel 10nm CPUs. Intel is going to face the most stern competition it has ever faced from TSMC in the process node race. TSMC has also said it intends to ramp 5nm with EUV in 2020.
http://www.tsmc.com/uploadfile/ir/quarterly/2016/4hBX9/E/TSMC 4Q16 transcript.pdf
Excerpt from TSMC Q4 2016 earnings call
Mehdi Hosseini - Susquehanna Financial Group - Analyst
Okay. Then when we look into 7 nanometer and some of your competitors have a different definition of 7. Can you help us understand how your N7, compete and is positioned against your competitors?
Elizabeth Sun - Taiwan Semiconductor Manufacturing Company Ltd - Senior Director, TSMC Corporate Communications Division
So Mehdi is saying that our 7 nanometer definition is different from other companies' 7 nanometer definition, so how do we compete at 7?
Morris Chang - Taiwan Semiconductor Manufacturing Company Ltd - Chairman
Our 7 nanometer definition is different from somebody else's? Well, I'll let Mark answer.
Mark Liu - Taiwan Semiconductor Manufacturing Company Ltd - President and Co-CEO
I wouldn't want to comment on other people's 7 nanometer. Our 7 nanometer is under qualification now and it will be qualified as according to plan from the end of first quarter. And we have already more than 20 customers design-in on this 7 nanometer and this year alone we estimate will be 15, 20 tapeouts already. So this is our momentum build so far on a seven nanometer and no other competitor is getting to this stage of this leading edge technology. So we have -- we are to -- remember I mentioned last time we'll have 5 nanometer two years from now and forget about the name. That will be a full node shrink and that will sit competing well with any technology come out at that time. Okay, let me add some on 7 nanometer. We will maintain our 7 nanometer competitiveness just like we do on 28 and 16. We will have a technology currently planned as 7 nanometer but with the EUV insertion in the second year of 7 nanometer, just one year -- approximately one year after. And that can greatly simplify the process and without increase the cost. And that is if customer can take advantage of minor design it can further reduce their density -- increase their density and reduce their die cost. That is our plan to maintain that competitiveness of the 7 nanometer the year after. So we think 7 nanometer is a well adopted node by all the customers and we plan for the subsequent technology to shore up the demand continuously. And we hope to use this technology -- I mean the second-year technology to prepare for the EUV production experience for the full fledged EUV technology on 5. Then our customers can have a very hopefully smooth getting to from our 7 to our 5 nanometer technology. So that is how we maintain our technology competitiveness.
Mehdi Hosseini - Susquehanna Financial Group - Analyst
May I ask a clarification question?
Elizabeth Sun - Taiwan Semiconductor Manufacturing Company Ltd - Senior Director, TSMC Corporate Communications Division
Sure.
Mehdi Hosseini - Susquehanna Financial Group - Analyst
I think if I heard you correctly is you will insert -- if I heard you correctly you said you will insert EUV in this second year of your 7 nanometer, which suggests to me that you may actually be able to commercialize (technical difficulty) conclusion here?
Elizabeth Sun - Taiwan Semiconductor Manufacturing Company Ltd - Senior Director, TSMC Corporate Communications Division
Mehdi, I'm afraid that your voice was broken at some point in time. Can you please repeat? We heard you, that you said that we will insert EUV in the second year of 7 nanometer and then you had something but it was cut off. Can you repeat that part?
Mehdi Hosseini - Susquehanna Financial Group - Analyst
Sure. Yes, sorry about that. I just wanted to make sure I understand the EUV commentary correctly. You said that you will insert EUV in the second year of 7 nanometer. That suggests to me that you may actually be able to insert EUV before competitors that have said insertion would happen at 5. Is that the right conclusion as we compare and try to better understand your competitiveness at 7 nanometer?
Mark Liu - Taiwan Semiconductor Manufacturing Company Ltd - President and Co-CEO
Yes, we will commercialize the 7 EUV in the second year of our 7-nanometer production. I wouldn't comment on when will our competitor insert their EUV. That is -- I don't intend to do the comparison here.
Another article about EUV at 7nm
http://semimd.com/blog/2017/01/19/innovations-at-7nm-to-keep-moore’s-law-alive/
TSMC’s 7nm development manager, S.Y. Wu, speaking at IEDM, said quadruple patterning and etch (4P4E) will be required for critical layers until EUV reaches sufficient maturity. “EUV is under development (at TSMC), and we will use 7nm as the test vehicle.
Huiming Bu, who presented the IBM Alliance 7nm paper at IEDM, said “EUV delivers significant depth of field (DoF) improvement” compared with the self-aligned quadruple (SAQP) required for the metal lines with immersion scanners.
A main advantage for EUV compared with multi-patterning is that designs would spend fewer days in the fabs. Speaking at ISS, Gary Patton, the chief technology officer at GlobalFoundries, said EUV could result in 30-day reductions in fab cycle times, compared with multiple patterning with 193nm immersion scanners, based on 1.5 days of cycle time per mask layer.
TSMC's 7nm EUV products should be out in H2 2019. AMD has a lot of choice and flexibility now that they have amended WSA. It would be interesting to see AMD CPUs manufactured at TSMC 7nm EUV go up against Intel 10nm CPUs. Intel is going to face the most stern competition it has ever faced from TSMC in the process node race. TSMC has also said it intends to ramp 5nm with EUV in 2020.