http://www.pcpro.co.uk/news/66...peed-breakthrough.html
Since it's short, here is the whole article:
"A new faster version 'strained silicon' has been developed by IBM and AMD. The companies are claiming that the resulting transistors are up to 24 per cent faster than existing processes.
The companies say that the new strained silicon process, named `Dual Stress Liner,` improves the performance of both n-channel and p-channel types of transistors by stretching the silicon atoms in one transistor and compressing them in the other.
As the speed increase occurs without any increase in power, the partners foresee a performance boost without incurring the kind of problems with heat dissipation which dogged Intel's attempts to increase the clock speed of its Pentium designs to 4GHz.
As an added bonus, dual stress liner can be introduced without massive investments in new production techniques and can be integrated into commercial production lines rapidly.
AMD says that it aims to introduce the new strained silicon technology into all of its 90nm processor platforms as soon as the first half of 2005. Among the chips to include dual stress liner technology will be multi-core AMD64 processors.
Further details will be announced at this week's IEEE International Electron Devices Meeting in San Francisco."
Since it's short, here is the whole article:
"A new faster version 'strained silicon' has been developed by IBM and AMD. The companies are claiming that the resulting transistors are up to 24 per cent faster than existing processes.
The companies say that the new strained silicon process, named `Dual Stress Liner,` improves the performance of both n-channel and p-channel types of transistors by stretching the silicon atoms in one transistor and compressing them in the other.
As the speed increase occurs without any increase in power, the partners foresee a performance boost without incurring the kind of problems with heat dissipation which dogged Intel's attempts to increase the clock speed of its Pentium designs to 4GHz.
As an added bonus, dual stress liner can be introduced without massive investments in new production techniques and can be integrated into commercial production lines rapidly.
AMD says that it aims to introduce the new strained silicon technology into all of its 90nm processor platforms as soon as the first half of 2005. Among the chips to include dual stress liner technology will be multi-core AMD64 processors.
Further details will be announced at this week's IEEE International Electron Devices Meeting in San Francisco."