Quoting myself for reference, this new patent is a lot more interesting and seems more practical than the thermoelectric stacked die patent that they made some years ago.
The theme around stacked dies is so recurring in all these patent applications you can bet it is happening real soon (Zen4 latest I would bet) ( similar to how I kept quoting patents for Zen 2 and they did happen for real )
This time, there are other chips stacked on top of the IOD.
It seems highly probable that the IOD will be based on the same process node.
The stacked chips are manufactured differently.
Everything will be wrapped together by a molding material as a single chip.
20190393124 ARRANGEMENT AND THERMAL MANAGEMENT OF 3D STACKED DIES
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What is described here is that
- The cache and the IO will be located on the center die which is a low heat producing block. This seems to reconcile with their patents of a big unified L3.
- The processor cores/compute blocks are on the periphery, with a dummy die stacked on top of them to take the heat out to the IHS. These are thermal hotspots which needs a good thermal path to the IHS.
- Fully 3D integrated. This allows a lot more room for what can be integrated on a single chip for a specific socket.
- The desire to route power via IHS comes from the fact that they want to stack the high heat producing blocks like cores on the top of the stack close to the IHS with the low heat producing blocks like the memory below on top of the substrate. Also applies to routing power to other dies stacks.
- Multiple dies will be stacked on top of the center IOD/Cache Die. These could be memory or other SFUs.
- Stacked dies are connected via TSV, bumps, conductive pillars and others (see quoted patents).
This patent is a specialization of the the one they filed in 2017. The patent seems to indicate that they have a more mature idea much closer to production based off patents they filed two years ago.
Their 3D stacked chiplet architecture coming full circle.
I think AMD has a good understanding of thermal issues associated with highly dense processes cropping from the move to 7nm for HPC applications and are reflected in a lot of their recent patents.
There are lots of patents around load/store improvements and Fabric efficiency which are very interesting as well but perhaps for another post.